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  • Tokyo Electron Tel Surface Preparation system ZETA Semi-auto
Tokyo Electron Tel Surface Preparation system ZETA Semi-auto

Tokyo Electron Tel Surface Preparation system ZETA Semi-auto

  • Throughput lilmit (hardware):675 450
  • Wafer per batch:150 100
  • ZETA™ 200/300 ZETA™ Semi-auto Wafer size (mm):150 200
  • On water temp capabililty >200℃
  • Product description: Tokyo Electron Tel Surface Preparation system ZETA Semi-auto, Throughput lilmit (hardware):675 450, Wafer per batch:150 100, ZETA™ 200/300 ZETA™ Semi-auto Wafer size (mm):150 200, On water temp capa
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Tokyo Electron Tel Surface Preparation system ZETA Semi-auto

Specifications:

Unique strip and clean capability in a flexible, economical, and production proven platform from the industry leader in batch spray wet processing.
The ZETA™ spray clean system provides the most effective and flexible batch solution for stripping of photoresist and other films, as well as general clean. Its unique ViPR™ technology offers the highest performance and lowest cost for resist, silicide and general film stripping needs. High temperature process of ViPR™ enables rapid removal of various heavy dozed photoresists and other organic films which are the most difficult material to remove with minimum consumable costs and maximum throughput. Delivering efficiency well beyond that achieved by other single wafer clean systems on the market. Post etch clean for both front-end and back-end are also available, as are RCA clean and DHF wet etch. The ZETA™ series has a large number of customer install base across industry. The system is available as fully-automated solution for 300/200mm wafers and as a semi-auto solution for 150/200mm wafers.

Product Comparison:

ZETA™ 200/300

ZETA™ Semi-auto

Wafer size (mm)

200

300

150

200

Availability

New, Certified used

New, Certified used

Wafer per batch

100

50

150

100

Throughput lilmit (hardware)

450

230

675

450

On water temp capabililty

>200℃

>200℃

Spray method

Directional atomization

Directional atomization

ViPR capable

Yes

Yes

Chemical dispense

Fresh single pass or recirculated

Fresh single pass or recirculated

Keywords:

Semiconductor silicon wafer production equipments, Wafer Fabricaton/12in, Wafer Fabricaton/8in, Wafer Fabricaton/6in Equipment, Wafer Fabricaton/Under 4in Equipment, Wafer Manufactureing Equipment, ASSY/TEST Equipment, Electrical parts equipmentAnlysis/Measurement equipmentSemiconductor production Common equipment.

Flason Electronic Co.,ltd provide a full Silicon Wafer prodocution line solutions, including Scanner Stepper Coat and Develop Dry Etch Asher Furnace RTP Epitaxy CVD PVD Ion Implant Wet Etch CMP Clean and Dry Plating machines and other Simeconductor Production machines you may need, please contact us for more information: wechat whatsapp IMO: 008613691605420, Skype: flasonsmt, Email: sales@flason-smt.com

FAQ

1) This is the first time I use this kind of machine, is it easy to operate?

There is English manual or guide video that show you how to use machine.

If you still have any question, please contact us by e-mail / skype/ phone /trademanager online service.

2) If machine have any problem after I receive it, how can I do ?

Free parts send to you in machine warranty period.

If the part is less than 0.5KG, we pay the postage.

If it exceeds 0.5KG, you need to pay the postage.

3) MOQ ?

1 set machine, mixed order is also welcomed.

4) How can I buy this machine from you? ( Very easy and flexible !)

A. Consult us about this product on line or by e-mail.

B. Negotiate and confirm the final price , shipping , payment methods and other terms.

C. Send you the proforma invoice and confirm your order.

D. Make the payment according to the method put on proforma invoice.

E. We prepare for your order in terms of the proforma invoice after confirming your full payment.

And 100% quality check before shipping.

F.Send your order by air or by sea.

5)Why choose us ?

A. Gold supplier on Alibaba !

B. Trade assurance to US$54,000 !

C. Best price & Best shipping & Best service !