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  • Tokyo Electron Tel Surface Preparation system ANTARES
Tokyo Electron Tel Surface Preparation system ANTARES

Tokyo Electron Tel Surface Preparation system ANTARES

  • Chemical dispense:Chemical and water free aerosol
  • Wafer per batch: Single wafer
  • Wafer Size (mm):200, 300
  • Spray method: Cryogenic-aerosol
  • Product description: Tokyo Electron Tel Surface Preparation system ANTARES
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Tokyo Electron Tel Surface Preparation system ANTARES

Specifications:

Production proven yield enhancing defect removal using a unique cryogenic inert gas technology
ANTARES™ is a series of a fully automated, single-wafer, CryoKinetic systems used for processing 200/300mm wafers. Each system uses cryogenic aerosol technology to safely remove nanoscale particles from device surfaces. Unlike conventional wet technologies, this all-dry process reduces defects without damaging the wafer surface, even on metal and low-k films. ANTARES™ series enables proven yield enhancing defect removal with no corrosion of metals, no watermarks on hydrophobic surfaces, and no wafer charging. The process is suitable for all materials.
ANTARES™ is a fully automated, single-wafer cleaning system that uses unique cryogenic aerosol technology to remove particulate contaminants and improve yield. The cryokinetic method is all dry and uses only inert gases, making it safe for processing even the most sensitive film types without surface reactions, roughening, or etching. ANTARES™ has been proven effective for yield enhancing defect removal across a wide variety of applications in the back-end and front-end.

Product Comparison:

ANTARES™ -Nano

ANTARES™

Wafer size (mm)

300

200, 300

Availability

New

New

Wafer per batch

Single wafer

Single wafer

Throughput lilmit (hardware)

Application dependent

Application dependent

Spray method

Cryogenic nano-aerosol

Cryogenic aerosol

Chemical dispense

Chemical and
water free aerosol

Chemical and
water free aerosol

Keywords:

Semiconductor silicon wafer production equipments, Wafer Fabricaton/12in, Wafer Fabricaton/8in, Wafer Fabricaton/6in Equipment, Wafer Fabricaton/Under 4in Equipment, Wafer Manufactureing Equipment, ASSY/TEST Equipment, Electrical parts equipmentAnlysis/Measurement equipmentSemiconductor production Common equipment.

Flason Electronic Co.,ltd provide a full Silicon Wafer prodocution line solutions, including Scanner Stepper Coat and Develop Dry Etch Asher Furnace RTP Epitaxy CVD PVD Ion Implant Wet Etch CMP Clean and Dry Plating machines and other Simeconductor Production machines you may need, please contact us for more information: wechat whatsapp IMO: 008613691605420, Skype: flasonsmt, Email: sales@flason-smt.com

FAQ

1) This is the first time I use this kind of machine, is it easy to operate?

There is English manual or guide video that show you how to use machine.

If you still have any question, please contact us by e-mail / skype/ phone /trademanager online service.

2) If machine have any problem after I receive it, how can I do ?

Free parts send to you in machine warranty period.

If the part is less than 0.5KG, we pay the postage.

If it exceeds 0.5KG, you need to pay the postage.

3) MOQ ?

1 set machine, mixed order is also welcomed.

4) How can I buy this machine from you? ( Very easy and flexible !)

A. Consult us about this product on line or by e-mail.

B. Negotiate and confirm the final price , shipping , payment methods and other terms.

C. Send you the proforma invoice and confirm your order.

D. Make the payment according to the method put on proforma invoice.

E. We prepare for your order in terms of the proforma invoice after confirming your full payment.

And 100% quality check before shipping.

F.Send your order by air or by sea.

5)Why choose us ?

A. Gold supplier on Alibaba !

B. Trade assurance to US$54,000 !

C. Best price & Best shipping & Best service !