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  • Tokyo Electron Tel Etch system Tactras Vesta
Tokyo Electron Tel Etch system Tactras Vesta

Tokyo Electron Tel Etch system Tactras Vesta

  • Process: Poly, SiN, Ox, Contact, Mask, Spacer
  • Number of chambers:1-6
  • Wafer Size (mm):300
  • Substrates: Si
  • Product description: Tokyo Electron Tel Etch system Tactras Vesta, Process: Poly, SiN, Ox, Contact, Mask, Spacer, Number of chambers:1-6, Wafer Size (mm):300, Substrates: Si
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Tokyo Electron Tel Etch system Tactras Vesta

Specifications:

Tactras, a leading technology provider with proven experience
Tactras series is the latest etch system from TEL. It is capable of continuous vacuum transfer of 300mm wafers and can support up to 6 process chambers with the option to add post process chambers. Tactras achieves the world's highest level of wafer transfer speed and footprint. It has been adopted by many customers and continues to evolve

Tactras Vesta is a 300mm wafer processing plasma etch system that provides enhanced control of plasma density and dissociation with its high frequency source plasma, utilizing the concept of capacitive coupled plasma chamber. Vesta is equipped with a unique PDC (Plasma Distribution Control) technology that enables radial distribution control of plasma density. Tactras Vesta owns a high market share in a key application of cutting-edge memory.


Product comparison

Tactras™ Vigus™

Certas™ LEAGA™

Tactras™ Vesta™

Tactras™ RLSA™

Tactras™ DRM

Tactras™ SCCM™

Chamber

Vigus™

Certas LEAGA™

Vesta™

RLSA™

DRM

SCCM™

Wafer size (mm)

300

300

300

300

300

300

Availability

New

New

New

New

New

New

Number of chambers

1-6

1-6

1-6

1-6

1-6

1-6

Process

Low-k, Ox,
HARC, Line etch, ALE, SAQP, DD

Ox

Poly, SiN, Ox,
Contact, Mask, Spacer

Ox, SiN, Poly,
Speacer, Contact, HARC, SAC

Ox, SiN,
Contact, Trench, SAC, Spacer, DD

Ox, SiN,
Contact, Trench, SAC, Spacer, DD

Substrates

Si

Si

Si

Si

Si

Si

Safety

S2, CE

S2, CE

S2, CE

S2, CE

S2, CE

S2, CE


Keywords:

Semiconductor silicon wafer production equipments, Wafer Fabricaton/12in, Wafer Fabricaton/8in, Wafer Fabricaton/6in Equipment, Wafer Fabricaton/Under 4in Equipment, Wafer Manufactureing Equipment, ASSY/TEST Equipment, Electrical parts equipmentAnlysis/Measurement equipmentSemiconductor production Common equipment.

Flason Electronic Co.,ltd provide a full Silicon Wafer prodocution line solutions, including Scanner Stepper Coat and Develop Dry Etch Asher Furnace RTP Epitaxy CVD PVD Ion Implant Wet Etch CMP Clean and Dry Plating machines and other Simeconductor Production machines you may need, please contact us for more information: wechat whatsapp IMO: 008613691605420, Skype: flasonsmt, Email: sales@flason-smt.com

FAQ

1) This is the first time I use this kind of machine, is it easy to operate?

There is English manual or guide video that show you how to use machine.

If you still have any question, please contact us by e-mail / skype/ phone /trademanager online service.

2) If machine have any problem after I receive it, how can I do ?

Free parts send to you in machine warranty period.

If the part is less than 0.5KG, we pay the postage.

If it exceeds 0.5KG, you need to pay the postage.

3) MOQ ?

1 set machine, mixed order is also welcomed.

4) How can I buy this machine from you? ( Very easy and flexible !)

A. Consult us about this product on line or by e-mail.

B. Negotiate and confirm the final price , shipping , payment methods and other terms.

C. Send you the proforma invoice and confirm your order.

D. Make the payment according to the method put on proforma invoice.

E. We prepare for your order in terms of the proforma invoice after confirming your full payment.

And 100% quality check before shipping.

F.Send your order by air or by sea.

5)Why choose us ?

A. Gold supplier on Alibaba !

B. Trade assurance to US$54,000 !

C. Best price & Best shipping & Best service !