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  • Tokyo Electron Tel Coater Developer CLEAN TRACK ACT M
Tokyo Electron Tel Coater Developer CLEAN TRACK ACT M

Tokyo Electron Tel Coater Developer CLEAN TRACK ACT M

  • Process:EB
  • Throughput (wph): S/A: 3
  • Wafer Size (mm):150
  • Substrates: 6025 MASK
  • Product description: Tokyo Electron Tel Coater Developer CLEAN TRACK ACT M, Process:EB, Throughput (wph): S/A: 3, Wafer Size (mm):150, Substrates: 6025 MASK
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Tokyo Electron Tel Coater Developer CLEAN TRACK ACT M

Specifications:

Established position as an industry standard system
The CLEAN TRACK ACT Series was developed as coater/developer to support 300/200mm wafer processes, based on the technology from the CLEAN TRACK Mark Series. The key concepts are high throughput, footprint reduction, and up time improvement. Additionally, these technologies are also applicable to mask process and low-k dielectrics, besides photolithography. Thanks to its high reliability as an industry standard system, the ACT Series continues to contribute to the customers’ productions.

The CLEAN TRACK ACT M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK ACT technology.


Product Comparison:

ACT 12
ACT 12 SOD

ACT 8
ACT 8 SOD

ACT M

Wafer size (mm)

200,300

100,150,200

150 (6 inch MASK)

Availability

New, Certified used

New

Throughput (wph)

Inline: 120

Inline: 120

S/A: 3

Process

i-line, KrF, ArF, SOD/SOG, Pl

EB

Substrates

Si, Glass

Si, GaAs, GaN, GaP,
SiC, Glass, Sapphire,
AlTiC, LT, Thin

6025 MASK

Additional features

Enclosed system, Precision hotplates

Enclosed system



Keywords:

Semiconductor silicon wafer production equipments, Wafer Fabricaton/12in, Wafer Fabricaton/8in, Wafer Fabricaton/6in Equipment, Wafer Fabricaton/Under 4in Equipment, Wafer Manufactureing Equipment, ASSY/TEST Equipment, Electrical parts equipmentAnlysis/Measurement equipmentSemiconductor production Common equipment.

Flason Electronic Co.,ltd provide a full Silicon Wafer prodocution line solutions, including Scanner Stepper Coat and Develop Dry Etch Asher Furnace RTP Epitaxy CVD PVD Ion Implant Wet Etch CMP Clean and Dry Plating machines and other Simeconductor Production machines you may need, please contact us for more information: wechat whatsapp IMO: 008613691605420, Skype: flasonsmt, Email: sales@flason-smt.com

FAQ

1) This is the first time I use this kind of machine, is it easy to operate?

There is English manual or guide video that show you how to use machine.

If you still have any question, please contact us by e-mail / skype/ phone /trademanager online service.

2) If machine have any problem after I receive it, how can I do ?

Free parts send to you in machine warranty period.

If the part is less than 0.5KG, we pay the postage.

If it exceeds 0.5KG, you need to pay the postage.

3) MOQ ?

1 set machine, mixed order is also welcomed.

4) How can I buy this machine from you? ( Very easy and flexible !)

A. Consult us about this product on line or by e-mail.

B. Negotiate and confirm the final price , shipping , payment methods and other terms.

C. Send you the proforma invoice and confirm your order.

D. Make the payment according to the method put on proforma invoice.

E. We prepare for your order in terms of the proforma invoice after confirming your full payment.

And 100% quality check before shipping.

F.Send your order by air or by sea.

5)Why choose us ?

A. Gold supplier on Alibaba !

B. Trade assurance to US$54,000 !

C. Best price & Best shipping & Best service !