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  • Tokyo Electron Tel Coater/Developer CLEAN TRACK ACT 12/ACT 8
Tokyo Electron Tel Coater/Developer CLEAN TRACK ACT 12/ACT 8

Tokyo Electron Tel Coater/Developer CLEAN TRACK ACT 12/ACT 8

  • Process: i-line, KrF, ArF, SOD/SOG, Pl
  • Throughput (wph): Inline: 120
  • Wafer size (mm):200,300
  • Substrates: Si, Glass
  • Product description: Tokyo Electron Tel Coater/Developer CLEAN TRACK ACT 12/ACT 8, Process: i-line, KrF, ArF, SOD/SOG, Pl, Throughput (wph): Inline: 120, Wafer size (mm):200,300, Substrates: Si, Glass
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Tokyo Electron Tel Coater/Developer CLEAN TRACK ACT 12/ACT 8

Specifications:

Established position as an industry standard system
The CLEAN TRACK ACT Series was developed as coater/developer to support 300/200mm wafer processes, based on the technology from the CLEAN TRACK Mark Series. The key concepts are high throughput, footprint reduction, and up time improvement. Additionally, these technologies are also applicable to mask process and low-k dielectrics, besides photolithography. Thanks to its high reliability as an industry standard system, the ACT Series continues to contribute to the customers’ productions.
The CLEAN TRACK ACT 12 and ACT 8 are 300/200mm coater/developer which enable stable, high-quality processing and smooth transition from R&D to volume production. The in-line model with exposure tool achieved almost the same footprint and moreover provides higher throughput by high-speed transfer system compared to the previous track series. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. In addition, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven.

Product Comparison:

ACT 12
ACT 12 SOD

ACT 8
ACT 8 SOD

ACT M

Wafer size (mm)

200,300

100,150,200

150 (6 inch MASK)

Availability

New, Certified used

New

Throughput (wph)

Inline: 120

Inline: 120

S/A: 3

Process

i-line, KrF, ArF, SOD/SOG, Pl

EB

Substrates

Si, Glass

Si, GaAs, GaN, GaP,
SiC, Glass, Sapphire,
AlTiC, LT, Thin

6025 MASK

Additional features

Enclosed system, Precision hotplates

Enclosed system

Keywords:

Semiconductor silicon wafer production equipments, Wafer Fabricaton/12in, Wafer Fabricaton/8in, Wafer Fabricaton/6in Equipment, Wafer Fabricaton/Under 4in Equipment, Wafer Manufactureing Equipment, ASSY/TEST Equipment, Electrical parts equipmentAnlysis/Measurement equipmentSemiconductor production Common equipment.

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FAQ

1) This is the first time I use this kind of machine, is it easy to operate?

There is English manual or guide video that show you how to use machine.

If you still have any question, please contact us by e-mail / skype/ phone /trademanager online service.

2) If machine have any problem after I receive it, how can I do ?

Free parts send to you in machine warranty period.

If the part is less than 0.5KG, we pay the postage.

If it exceeds 0.5KG, you need to pay the postage.

3) MOQ ?

1 set machine, mixed order is also welcomed.

4) How can I buy this machine from you? ( Very easy and flexible !)

A. Consult us about this product on line or by e-mail.

B. Negotiate and confirm the final price , shipping , payment methods and other terms.

C. Send you the proforma invoice and confirm your order.

D. Make the payment according to the method put on proforma invoice.

E. We prepare for your order in terms of the proforma invoice after confirming your full payment.

And 100% quality check before shipping.

F.Send your order by air or by sea.

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